Hi everybody.

Does anyone have experience in bonding borofloat glass to silicon wafer?

I am using recipe of 1000V and 400degree celcuse in vaccume environment,

however, after applying  that bonding condition for an hour, the glass and
the

wafer still not being bonded. Only same weak connection randomly happened,

which results the  interfering pattern. The wafers can easily be separated.

Does anyone know the bonding condition for borofloat glass and Si?



the FAIL experiment records are :

voltage : 1000V

temperature:  400C

pressure:  9mtorr

bonding: 1 hr

bonding current: 0.02mA (form starting to the end) ....WHY?

Charge: 0~6e-2 (form starting to the end)


Any help would be greatly appreciated.

Greetings,

IAN Hsiao.