Hello all,

I am solving a problem with masking of the boro-silicate and soda-lime glass
samples. I need a Ti mask on the glass with straight lines without Ti layer. The
straight lines are from 1 to 3 um (widths of the mask opening ). One chance is
make Lift off procedure but I think it could be done by simpler way.

 I would like to make 100-200 nm Ti layer on the glass surface (i.e. BK7...),
than I coat a photoresist (i.e. SU8), develop and do anisotropic etching of the
titanium layer. I have found some solutions like H2O2, HF, KOH which are
suitable for Ti layer etching but HF is dangerous and also I afraid about
undercutting and glass surface damage.
Does anyone know some suitable recipe for this work?

Thanks a lot for any suggestion.

Ferda Mravenec