Hello All,

This is sort of a generalization of one of the previous questions - I am trying
to coat Aluminum films of thickness  around 150nm on quartz substrates.. I have
tried using RF-sputtering and also e-beam evaporation. In both cases the film
quality was not very good. There were these hillocks forming all over the film.
Could anyone please recommend any recipe for obtaining hillock free Aluminum
films.

Thanks,
Sreemanth





> From: walter@elume.com
> To: nataraj@precico.com.my; mems-talk@memsnet.org
> Date: Mon, 19 May 2008 09:25:57 -0700
> Subject: Re: [mems-talk] HELP REQUIRED IN AREA OF ALUMINUM SPUTTERING
>
> There are,a few possibilities .
> In the past I have seen this with my own Al films.
> A  the chamber is contaminated
> B  the base pressure was not low enough prefer low sis minimum
> C  leaks in the chamber like O2.
> Is the chamber pumped using diffusion you need an LN trap
> If all these areas are covered in theory the film should not look milky
> Walter
> www.elume.com