Hi , Yes I second the motion H2O2 works great. For Ni we use a diluted Nitric acid. www.elume.com ----- Original Message ----- From: "Samadhan B. Patil"To: "General MEMS discussion" Sent: Monday, November 24, 2008 1:28 AM Subject: Re: [mems-talk] Ti and Ni wet etching in HF > Anirban, > > You can try H2O2 at 40C for wet etching of Ti with other metal mask > (generally Al). We use H2O2 to for the wet etching of TiW. > > Samadhan Bhaulal Patil