Do you have any oxide layer on top? Also how deep do you want to etch? I
have tried etching shallow trenches (~3-5microns) and it worked fine.

Mehmet

On Wed, Feb 18, 2009 at 5:21 AM, İlker Comart  wrote:

> Hi to all,
>
> I want to use sputtered Cr/Au layer as a mask for the anisotropic KOH Si
> etching, however I could not find any resources about this subject on the
> internet. Can Cr/Au layer be suitable for this kind of process?
>
> --
> Ilker Comart

Mehmet Aykol
University of Southern California
EE - Electrophysics
Phone: (213) 821-4090