My colleague tried this with thermally evaporated Cr/Au for a deep KOH
etch of silicon, but the results were very poor.

Jason Milne

Microelectronics Research Group
The University of Western Australia

Quoting ?lker Comart :

> Hi to all,
>
> I want to use sputtered Cr/Au layer as a mask for the anisotropic KOH
> Si etching, however I could not find any resources about this subject
> on the internet. Can Cr/Au layer be suitable for this kind of process?
>
> --
> Ilker Comart