Hi guys,

I believe you could find lots of references about image reversal.

First, you have to design your mask with dark field on the metal you want them
to stay or pattern.
Spin 1827 - soft bake - expose UV - YES oven for image reversal - flash expose
22 seconds with UV on the whole wafer - developer 319 for 1 min - Descum with
March RIE before sputtering your metal. Ti - 40 nm, Pt - 200 nm for me.

That is about what I did.

Thanks,
Huihang


> Date: Fri, 21 Aug 2009 10:45:24 -0500
> From: liuxiaoguang@gmail.com
> To: mems-talk@memsnet.org
> Subject: Re: [mems-talk] Lift- off Ti/Pt
>
> Hi Huihang
>
> Could you share with us how you did image reversal with S1827 please?
>
> Thanks,
> Leo