It sounds to me like you're talking about the reflow processes which are
more common in micro optical applications. In essence the resist is
heated up so that its Tg is exceeded and it then sags to form a dome
profile.

Daniel


-----Original Message-----
From: Andrea Lucibello [mailto:Nonnini@tiscali.it]=20
Sent: 01 October 2009 18:42
To: General MEMS discussion
Subject: [mems-talk] Bilayer photoresist process

Hi all,

Does anyone know if it is possible to planarize photoresist (change its
shape from square to round)? I know that exist a method called Bilayer
photoresist process?  How does this process work?

Thanks in advance for the help.

Regards
A.L