Hi all,

say you dip a  wafer in HF/BHF for a few seconds, pull it out,
rins with DI water and start your stopwatch (t=0). How quickly will
the native oxide layer grow at nominal conditions (room temp, 1 atm)?
How thick will it be after 1 day, 1 week, 1 year... etc?

Any info would be very interesting. Thanks a lot.