Parrish, I have found this flow to give a great neg profile: Coat 5214 Resist Softbake Bake 5 min @100C contact Cool Quickly cool Expose PEB bake 118c 1:30 min Cool 3 min slow cool Expose 60 sec Develop 45 sec at RT, 2 min rinse Ad StarCryo Electronics -----Original Message----- From: mems-talk-bounces+ahall=starcryo.com@memsnet.org [mailto:mems-talk-bounces+ahall=starcryo.com@memsnet.org] On Behalf Of Parrish Ralston Sent: Tuesday, February 22, 2011 7:59 AM To: mems-talk@memsnet.org Subject: [mems-talk] Overcut AZ5214 profile I was wondering if anyone has a recipe for AZ5214 as a negative photoresist (or any other negative photoresist) that has good step coverage, and overcut sidewalls. I have been trying for a while to use positive photoresist as a continuity layer that resides between a MMIC chip set in a cavity and a Ti/Au seedlayer for electroplating. I deposit KMPR on top of the seed layer as an electroplating mold and the solvents in the KMPR react with the positive photoresist. It doesn't seem to matter than I have thickened my seed layer in attempts to better isolate the two layers. So I would like to try and use a negative resist which hopefully will hold up better to the KMPR. But I still need good step coverage and a good, overcut sidewalls so my seed layer is still continuous. Thank you, Parrish