Majid,
          Lets discuss this it may be possible.  It will need experiments.
Silylation can make positive resist stable up to 300 degrees C and image
reversal will give perfect lift off profiles to positive resist.  I do not know
of a negative resist that offers any hope.  Bill Moffat 925 373 8353.

________________________________________
From: mems-talk-bounces+bmoffat=yieldengineering.com@memsnet.org [mems-talk-
bounces+bmoffat=yieldengineering.com@memsnet.org] on behalf of Majid Beidaghi
[mbeid001@fiu.edu]
Sent: Saturday, August 06, 2011 4:53 PM
To: mems-talk@memsnet.org
Subject: [mems-talk] Negative resist foe lift-off and stable at 250C

Hi All,

Could anybody please suggest a negative tone resist that is suitable for
lift-off and is stable up to 250 ° C. I want to achieve a thickness of at
least
10 micron.

Thanks

--
Majid Beidaghi
PhD Candidate
Department of Mechanical and Materials Engineering
Florida International University