Use omnicoat from microchem as a release layer. - Kevin On Wed, Aug 10, 2011 at 11:41 AM, sumit kalsiwrote: > Hi, > > I am trying to use positive resist as a sacrificial layer for releasing the > entire SU8 sheet (22mmx22mm) from my glass substrate. After postbaking the > combination, I observed bubbles in the resist layer. I used AZ400k to dissolve > the positive resist after developing SU8 but it did not come off. Anyone have > any experience in this? > > Thanks a lot. > > Regards, > > Sumit