durusmail: mems-talk: NR9 rough sidewall
NR9 rough sidewall
2011-09-21
2011-09-21
2011-09-21
NR9 rough sidewall
Alex Mellnik
2011-09-21
Try raising the pre-bake to 160-165,  you may also want to mix the RD6 3:1
with water to increase the development time.

-Alex

On Wed, Sep 21, 2011 at 12:02 AM, Xiaohui Lin
wrote:

> Hi all, I was processing NR9-1000P and find the sidewall pretty rough. Pic
> can be found here:
>
>
> https://picasaweb.google.com/113316121597573259487/September20201102?authuser=
0&authkey=Gv1sRgCOv_isDQ1MeRhwE&feat=directlink
>
> Could anyone suggest any possible solution for that?
>
>    1. substrate: 1mm glass slice, one side is coated by Cr/Au, 10nm/40nm
>    2. spin on NR9 at 3000rpm, we are aiming at around 1um thickness, not
> critical
>    3. pre-bake: 150 oC hotplate for 3 min
>    4. exposure: MA6, Ch1, hard contact, 10s, 7.5mJ/cm2
>    5. PEB: 100oC hotplate 3 min
>    6. develop: RD6,  20s
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