Try pre bake temp of 155,with 3 minute and decelop time to 1 minute.

Bhupesh

Indian Institute of Technology Madras
India

On Wed, Sep 21, 2011 at 6:04 PM, Alex Mellnik  wrote:

> Try raising the pre-bake to 160-165,  you may also want to mix the RD6 3:1
> with water to increase the development time.
>
> -Alex
>
> On Wed, Sep 21, 2011 at 12:02 AM, Xiaohui Lin
> wrote:
>
> > Hi all, I was processing NR9-1000P and find the sidewall pretty rough.
> Pic
> > can be found here:
> >
> >
> >
> https://picasaweb.google.com/113316121597573259487/September20201102?authuser=
0&authkey=Gv1sRgCOv_isDQ1MeRhwE&feat=directlink
> >
> > Could anyone suggest any possible solution for that?
> >
> >    1. substrate: 1mm glass slice, one side is coated by Cr/Au, 10nm/40nm
> >    2. spin on NR9 at 3000rpm, we are aiming at around 1um thickness, not
> > critical
> >    3. pre-bake: 150 oC hotplate for 3 min
> >    4. exposure: MA6, Ch1, hard contact, 10s, 7.5mJ/cm2
> >    5. PEB: 100oC hotplate 3 min
> >    6. develop: RD6,  20s
>