durusmail: mems-talk: PECVD silicon nitride step coverage for 5um step
PECVD silicon nitride step coverage for 5um step
2012-11-19
PECVD silicon nitride step coverage for 5um step
Sheng Zhang
2012-11-20
The equipment is oxford plasma lab 80+. Patterns are ~50um wide trenches,
gold patterns on glass substrate.

Thanks!


On Mon, Nov 19, 2012 at 11:34 AM, Ruiz, Marcos Daniel (SGNCOE) <
Dan.Ruiz@honeywell.com> wrote:

> Please provide more information about what you have to work with and what
> you're trying to accomplish.
>
> 1 - What equipment are you working with?
>
> 2 - What does your topography look like (open steps, trenches, contact
> holes)?
>
> 3 - What is the composition of the parts you need to process?
>
> Depending on what kind of coverage you need and what equipment you have
> available, PECVD may or may not be the best answer for you.
>
> Dan
>
> -----Original Message-----
> From: mems-talk-bounces+dan.ruiz=honeywell.com@memsnet.org [mailto:
> mems-talk-bounces+dan.ruiz=honeywell.com@memsnet.org] On Behalf Of Sheng
> Zhang
> Sent: Monday, November 19, 2012 8:38 AM
> To: mems-talk@memsnet.org
> Subject: [mems-talk] PECVD silicon nitride step coverage for 5um step
>
> Hi,
>
> Does anyone has experience of PECVD silicon nitride on 5um steps? I'd love
> to have some suggestions or recipe to start with.
>
> Thanks!
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