Make sure you have an i-line filter in you mask aligner. Mask contact is also critical. Thick layers can bow the wafer and cause problems with contact. Allow the resist to rest after spinning and ramp all bake steps (up and down) to avoid excessive stress. There are other tricks such as exposing from the back side through a glass substrate to achieve these structures. On 14 January 2013 00:18, Nirmal Punjabiwrote: > Hello, > > Greetings for the day. > I want to make SU-8 structures with high aspect ratios ~20:1. > I want to make structures having width upto 10um & thickness of 200um. > I am using SU-8 2100. > Does anybody has some experience in fabricating high aspect ratios > structures in SU-8? > Any experiential tips in this regard will be highly appreciated. > Thank you. > > Regards, > > Nirmal Punjabi > _______________________________________________ > Hosted by the MEMS and Nanotechnology Exchange, the country's leading > provider of MEMS and Nanotechnology design and fabrication services. > Visit us at http://www.mems-exchange.org > > Want to advertise to this community? See http://www.memsnet.org > > To unsubscribe: > http://mail.mems-exchange.org/mailman/listinfo/mems-talk > _______________________________________________ Hosted by the MEMS and Nanotechnology Exchange, the country's leading provider of MEMS and Nanotechnology design and fabrication services. Visit us at http://www.mems-exchange.org Want to advertise to this community? See http://www.memsnet.org To unsubscribe: http://mail.mems-exchange.org/mailman/listinfo/mems-talk