durusmail: mems-talk: Silicon Carbide Issue
Silicon Carbide Issue
2015-12-08
Silicon Carbide Issue
Morrison, Richard H., Jr.
2015-12-09
What is your problem film not sticking?

If yes what kind of sputter etch are you doing before the Ni deposit starts.

Is this a DC Mag system?

What is your chamber base pressure in Torr?

Are long is your pre-sputter to the shutter before the deposit?

What is your Argon gas pressure?

Rick


Draper
Principal  Member of the Technical Staff
Group Leader Microfabrication Operations
555 Technology Square
Cambridge Ma, 02139-3563

www.draper.com
rmorrison@draper.com
W 617-258-3420
C 508-930-3461





-----Original Message-----
From: mems-talk-bounces+rmorrison=draper.com@memsnet.org [mailto:mems-talk-
bounces+rmorrison=draper.com@memsnet.org] On Behalf Of bhargav panchal
Sent: Sunday, November 29, 2015 12:01 PM
To: General MEMS Discussion 
Subject: [mems-talk] Silicon Carbide Issue

We have problem regarding nickle deposition on Silicon nitride by sputtering.
Prior to deposition we have removed the oxides from the surface. Please suggest
possible solution.

Have a good day everyone.

Regards, Bhargav Panchal+91 9742712671
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