> I am trying to find some information about > UV-ozone clean in the area of semiconductor > fabrication. Specifically, I am interested > in the comparision between UV-ozone clean > and O2 plasma clean. Is there any advantage > of ozone? I really couldn't find any useful > information on the web. Could anyone provide > anything that I can start with? Thanks much. Advantage of ozone: no ion bombardment, which can damage some electronic devices Disadvantage of ozone: for our systems at least, it is much slower than an oxygen plasma --Kirt Williams Agilent Technologies