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Interface thermal conductance between LPCVD Si3N4 and sputtered Al (Aaron Datesman)
Aspect ratio of 4:1 or higher using BPR-100 photoresist on Metal (Paul Nguyen)
pdms stuck (Emanuele Orabona)
Temporarily masking samples (Edmondo Battista)
Temperature measurement of microheater (Jungwook Choi)
Turning Si surface hydrophobic (Miyakawa, Natsuki)
PDMS ratio (Priya)
pdms stuck (Gareth Jenkins)
Turning Si surface hydrophobic (Bill Moffat)
pdms stuck (Mikael Evander)
PDMS ratio (Geir Bjørnsen)
Turning Si surface hydrophobic (Miyakawa, Natsuki)
Thin PDMS (Priya)
Turning Si surface hydrophobic (Ned Flanders)
Thin PDMS (Mikael Evander)