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mems-talk
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Silicon etch low roughness (Chilcott, Dan - GS)
SiO2 RIE etching without carbonizing the photoresist (weiquan yang)
50 nm resist (Michael Cooke)
SiO2 RIE etching without carbonizing the photoresist (Bob Henderson)
Silicon etch low roughness (Wendell McCulley)
SiO2 RIE etching without carbonizing the photoresist (Brad Cantos)
patterning sub-micron holes in chromium (Marc Reinig)