You can use maN-490 from www.microresist.de for film thickness in the
range 5-16um. Since it is a negative resist, you can use flood exposure on
the final pattern and remove it with your standard developer.  You can
also use organic solvents.

Kristjan Leosson, Ph.D.
Process Development Engineer
Lumiscence A/S

-----Original Message-----
From: anttipe@cc.hut.fi
Subject: [mems-talk] About Negative Photoresist

I'm looking for negative photo resist for 5 to 30 um processing. In this
process the resolution is not important. The resist and developer should (if
possible) be nontoxic. It would nice to have resist stripped in Ace or in
some AZ developer. I know Japanese have resist called NFR015, but they
doesn't seem to sell it to Europeans. I wonder what you might know about
PR's or PR vendors?