durusmail: mems-talk: About Negative Photoresist
About Negative Photoresist
2005-05-09
2005-05-09
2005-05-11
About Negative Photoresist
kl@mmphotons.dk
2005-05-11
Chad

You are right, of course.  My apologies if the previous message caused
confusion.

Kristjan Leosson
Lumiscence A/S

Quoting Brubaker Chad :
> I'm not sure if that is correct.  Negative tone resists work by becoming
> cross-linked (i.e., less soluble) when exposed to UV.  So, the flood
> exposure process you described would just be re-exposing the regions
> that were already exposed the first time around (since the pattern is
> there due to the fact that it was exposed in the first round).

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