Satish, I know this problem. You have CxFy-polymer on top of resist and the ion bombardment in RIE-chamber makes the film harder - so Aceton or what ever you use - doesn't help. You can try: O2-plasma first to remove this polymer film then Aceton/IPA. If not: order cleaning agent Pine Alpha from Arakawachem Japan. It works. good luck Ha-Duong Ngo At 05:00 20.05.2008, you wrote: >Hi! > >I have problem removing photo resist after using it as mask for >ICP-RIE etching. I tried Acetone, Acetone+Sonication, PR stripper, >Asher. Nothing is working. Did anyone face this problem before. If >anyone has any solution for this problem please tell me.