maybe it's not the photoresist but the residue of ICP etching. Have you tried piranha and have you tried to analyze the composition of the resist? ÔÚÄúµÄÀ´ÐÅÖÐÔø¾Ìáµ½: >From: "Jason Milne">To: "'General MEMS discussion'" >Subject: Re: [mems-talk] PR removal after ICP RIE etching >Date:Wed, 21 May 2008 12:42:32 +0800 > >I run into this problem frequently with AZ2035, a negative resist. The > problem occurs with negative resists if you take the resist above a > certain temperature (~125C for AZ2035), or if you use CF4 plasma, even > at low temperatures. > > I remove the baked-on resist using hot AZ Kwik Strip, but I imagine > other photoresist strippers will work. 5 minutes in a bath of Kwik Strip > with the hotplate set to 100C, and the resist is gone. Alternatively, an > overnight soak at room temperature seems to work. > > The same technique works if the resist gets too hot during a liftoff > metal deposition. If liftoff fails in acetone, try using hot photoresist > stripper instead. I have saved many samples this way. > > I would recommend trying the overnight soak first, and if that doesn't > work then make sure you take appropriate precautionary steps when > heating up Kwik Strip, or whatever stripper you use.