Have you tried doing a brief descum or surface plasma etch prior to developing? In the past when I used an iodine solution to etch electroplated gold this usually helped. Brad Cantos On 9/2/08 3:44 PM, "rmartin@systron.com"wrote: > I did some research on positive resist development but could not find > any literature that shows what the development mechanism is of the > indene-carboxylic acid photoproduct. Am I to assume that it's a straight > redox reaction (we use NaOH for our developer) producing a soluble salt > by-product and water? > > On a related note, I am trying to develop a flood expose and develop > strip system to remove photoresist (using a mercury arc lamp as an exposure > source and our current developer to strip). It worked well in the initial > stages, but now we are getting some residue which seems to be a result of > the photoresist being affected by other wet processes involving > permanganate and/or iodine. Would increasing NaOH concenration help > dissolve the resist? Your thoughts are appreciated. >