Or does plasma cleaning help because it removed a top layer of crosslinked
resist so that the developer can attack the "virgin" layer?  Is that the
premise?


rmartin@systron.com writes:

Hi Brad/Bill,

      I am totally intrigued by your suggestions.  How does plasma cleaning
help development?  Does it reverse the cross-linking that occurs?  Again,
our aim was to re-expose used resist and strip it off by development.  The
issue is that a top layer of that resist has been cross-linked (based on
development behavior) and in some instances, leave residue on the wafer.
Your thoughts are appreciated.