Hi everyone, I am using SPR 220-7 photoresist and am looking at 7 micron thickness. I am spinning at 3500 rpm for 30 seconds and also tried 3k rpm for 30 seconds. I see a lot of streaks on the wafer and not getting a uniform coating. I did take a look at Stanford nanofab website (www.snf.edu) but the problem is that I have manual spinners and their manual procedure is also not working fine for me. If anyone has worked with it before, your suggestions would be invaluable. Thanks in advance. Forum