Hi All,

I want to etch 100 microns of Si using Bosch DRIE and I'm unable to use
some well known masking materials such as SiO2/ Al/Al2O3 for specific
reasons.

So has anyone tried some other masking material than the above with
reasonable selectivity? For instance, I could think of a spin-on
material such as resist or SOG ?

Please share your experiences, either in the forum or in person (by
e-mail). Any tip(s)/suggestion(s) are appreciated.

Thanks,
Vijay

TU Delft