durusmail: mems-talk: Masking Material for DRIE
Masking Material for DRIE
Masking Material for DRIE
James Paul Grant
2009-10-13
Yes SPR220 is also a good photoresist to use. I've heard many people
it's pretty similar to AZ4562 in terms of performance. Not sure about
the cost though!

Alexandre Boé wrote:
> Hi,
>
> I have used AZ4562 (8 ?m) to etch via holes trough 200 ?m of Si
> without any problem. More recently, I have used SPR220 (5 ?m-thick) to
> etch 150 ?m of Si.
>
> Regards,
>
> Alex
>


--
Dr. James Paul Grant
Postdoctoral Research Associate
Microsystems Technology Group
76 Oakfield Avenue Room 3
University of Glasgow
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Telephone: +44(0)141 330 3374

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