I am having problems cleaning this Hard mask, That is to remove the extra PDMS that is stuck to the hard mask. We tried O2 plasma, IPA with and without ultrasonicating. Nothing is helping that poor PDMS to detach from the silicon hard mask. How do you guys do it? Another problem is making the PDMS mold for the NIL process. When made there is a formation of clarity diorder it looked like a fogged glass. what do you guys think this is? help needed. Thanks for replying, sung mung, International Scholar, IMEC Belgium.