Josh, Have you considered simple image reversal on standard positive resist. I have seen dimensions of 0.08 micron lines and spaces done simply and repeatedly. CNF at Ithaca has lots of YES equipment and I can walk you through the correct processing. Bill Moffat -----Original Message----- From: mems-talk-bounces+bmoffat=yieldengineering.com@memsnet.org [mailto:mems- talk-bounces+bmoffat=yieldengineering.com@memsnet.org] On Behalf Of Roy Yang Sent: Thursday, September 15, 2011 1:28 PM To: General MEMS discussion Subject: Re: [mems-talk] ALD liftoff and underneath contact solution Hi Alex, Thanks a lot for your reply. I have not yet come up with a plan to do optical lithography about the device, and I will have to use ebeam lithography and bi- layer PMMA for another while. Do you happen to have any successful ALD lift-off experience with PMMA? I have thought of adding another lithography layer to etch the ALD coating and expose the bottom contact to probe. I worried about any HF-based wet etching will take away the adhesion layer of my bottom contact. Also I doubt whether I can find a dry etching tool that allows gold inside (I do most of my processing CNF at Ithaca, NY). Best regards, Josh