I used SU-8 2002 for sacrificial layer(about 2um). after whole process is finished, I want to remove SU-8 layer. but, it is very hard. I used Remover PG(80℃, 30min) but it is indissolubleness(?). For forming mems sensor, the metal layers are deposited around a SU-8 layer. So I want to remove SU-8 2002 without damages of other structures. How can I do it? _______________________________________________ Hosted by the MEMS and Nanotechnology Exchange, the country's leading provider of MEMS and Nanotechnology design and fabrication services. Visit us at http://www.mems-exchange.org Want to advertise to this community? See http://www.memsnet.org To unsubscribe: http://mail.mems-exchange.org/mailman/listinfo/mems-talk