370mm x 470mm is much larger than what you are likely to find in most
lithography tools.  Interference lithography is a possible way to do this.
You can produce the periodic submicron lines by combining two parts of a
laser beam. But the setup won't be straightforward or inexpensive. I do
interference lithography here, but only on small pieces. I saw a talk by a
German company that could expose very large sizes (several feet) using
interference lithography for space optic applications. if you need info on
that, I can probably dig that up.




On Tue, Jun 28, 2016 at 8:56 PM, John Bohland 
wrote:

> I am interested in making a metal grid on a 370 mm X 470 mm glass
> substrate.
>
> The problem is that the metallization lines must be only 1.5 microns in
> width and spaced (pitch) only a few microns apart.
>
> The metal can be Al or Ag and 100 nm thick.
>
> The best idea I have is to monolithically coat the glass with sputtered
> (PVD) Al or Ag then use a picoseond laser to remove all but the desired 1.5
> micron wide metal line widths. Even then I don't know if the laser would
> have good enough resolution to meet these requirements.
>
> Anyone have better ideas?
>
> Thanks,
>
> John
>
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