You should let us know what resist you did use and the narrowest width you want
to make. Without these information..It is somewhat annoying because it seems you
don't have any evaporator or sputter. So let us know your design specs and
availabity of sputter or evaporator.

  sokwon

Marc Häfner  wrote:
  Hi,

you can also use Titanium as adhesion layer....

Regards

Marc

-----Ursprüngliche Nachricht-----
Von: Kannan Ramaraj [mailto:aerokannan@rediffmail.com]
Gesendet: Dienstag, 29. August 2006 12:51
An: mems-talk@memsnet.org
Betreff: [mems-talk] Regarding Glass lithography


Hi all!
I am trying to make one-dimensional groove pattern over the glass
surface with a width and depth ranging from 50micron to 200 micron. I
laminated dry photoresist over the glass surface and prepared the pattern in
the glass surface. Photoresist is not staying more than 1 minute if i put it
in dilute HF. And also I read in this site that I can use Chromium as a
sacrificial layer. But I don't have chromium with me. Can you suggest some
other material as a sacrificial layer ? Whether I have to coat my
sacrificial layer before or after the photoresist ? Please give some idea to
overcome this issue.