durusmail: mems-talk: fudging/spreading around the PR features
fudging/spreading around the PR features
2007-10-05
2007-10-05
2007-10-06
NC-200
2007-10-08
Lithographic Tests masks for the EVG620
2007-10-12
2007-10-05
2007-10-06
Sapphire stiffness matrix
fudging/spreading around the PR features
Andrea Mazzolari
2007-10-05
Hello,
please specify all the process conditions (substrate, primer, soft bake
temperature and time etc...)

Andrea

> I am new to Photolithography. I am doing Photolithography with S1813.
> Many a times I get fudging/spreading of photoresist around the edge of
> the photoresist features after developing. They look more or less like
> threads spreading outward from the feature.
> Does anyone know what am I doing wrong?
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