Another trick is to enlarge your sample artificially. You can do it by
placing dummy samples around the edges touching each other. In that way
photoresist does not see the edges of your substrate and it sill
acummulate in the edges of the dummys.


Felix Lu escribió:
> Dear Lei,
>
>      I would try two approaches:
> 1. expose the outer edgebead with a high mag objective using white
> light so that it develops away
> 2. try using an acetone reflow process to even out the edgebead.
>
> Good luck!
>
> Felix