ICP is RIE. Besides, XeF2 doesn't need plasma to work. IOW, not sure where your train of thoughts is headed to. m On 1/8/11, caozijian.cn@gmail.comwrote: > RIE or ICP? > > > ------Original Message------ > From: Paul Sunal > To: General MEMS discussion > ReplyTo: Paul Sunal > Re: [mems-talk] etch rate of Ag in XeF2 > Jan 7, 2011 20:06 > > Tricia, > > It does! But in a complex manner. I don't have the etch rate, but I > know from experience that the Ag undergoes some sort of chemical > reaction and then etches away. It is slower than the etch rate of > silicon, but still fairly fast. > > Regards, > > Paul