I think you can increase exposure time to 20s or 30s and reduce PEB to
2mins at 95C.

Best regards,

 Jin Yu


-----Original Message-----
From: Xiaohui Lin [mailto:xiaohui.lin@mail.utexas.edu]
Sent: 09 November 2011 05:01
To: General MEMS discussion
Subject: [mems-talk] Help with SU8 2005 recipe on glass substrate

I am using SU8 2005 on 1mm thick glass substrate coated with 50nm Cr/Au.

spin coat 4krpm
bake 95C, 3min
exposure 8s
PEB:   65C, 7min
develop: 40s

I am getting a pretty rough sidewall as the picture in the following
link.

Could anyone suggest what is the problem?

Thanks.

https://plus.google.com/u/0/photos/113316121597573259487/albums/56728554
10267307473