could you advise what is adequate rinsing? I dip in SU8 developer for 20-30s then rinse with IPA. Is it the correct step? I do notice the white stains if under-develop, for example, IPA rinse after just 10s developing. Thanks. On Thu, Nov 10, 2011 at 7:55 AM, Andrew Saranganwrote: > I suspect the problem is due to under-development or inadequate > rinsing. SU8 will create white stains if it is rinsed before fully > developed. The same effect could happen if old developer is used. > Since your roughness seems to extend up the wall to the top of the > cured surfaces, in adequate rinsing could also be a factor. > > On Wed, Nov 9, 2011 at 12:01 AM, Xiaohui Lin > wrote: > > I am using SU8 2005 on 1mm thick glass substrate coated with 50nm Cr/Au. > > > > spin coat 4krpm > > bake 95C, 3min > > exposure 8s > > PEB: 65C, 7min > > develop: 40s > > > > I am getting a pretty rough sidewall as the picture in the following > link.. > > > > Could anyone suggest what is the problem? > > > > Thanks. -- Lin, Xiaohui Ph.D. Program in Electrical and Computer Engineering Nanophotonics and Optical Interconnects Group Microelectronics Research Center The University of Texas at Austin E-mail: xiaohui.lin@mail.utexas.edu Office: (512) 471-4349