It is typical that you will have a bias difference between what is in the mask
vs. wafer. How much depends on your process. Can you change exposure?

Robert

-----Original Message-----
From: mems-talk-bounces+r-black1=ti.com@memsnet.org [mailto:mems-talk-
bounces+r-black1=ti.com@memsnet.org] On Behalf Of KarthiKeyan K
Sent: Wednesday, June 24, 2015 10:05 PM
To: General MEMS discussion
Subject: [mems-talk] SU8 2075 Pattern - Reg:

​Dear Friends,

Actually i am working in SU8 2075 negative ​photoresist and am facing to achieve
exact size of mask pattern on my SU8 photoresist for the example my mask pattern
size is 50 micro meter means i have achieved 60 micro meter.


So Please suggest how to get exact size of the mask pattern on my SU8
Photoresist layer??? any parameter to get exact size of the mask pattern on my
SU8 Photoresist.??

Looking forward to your suggestions.

Thanking you,

Best Regards,
Karthi
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Visit us at http://www.mems-exchange.org

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