durusmail: mems-talk: Best way to make elemental Cr films
Best way to make elemental Cr films
2015-10-14
Best way to make elemental Cr films
Ali Alsaqqa
2015-10-19
Thanks Andrew. Are you suggesting depositing at a higher rate to reduce the
total time of deposition and hence time of exposition to oxygen? I would
have thought that the higher the rate, the higher the chamber temperature
and hence the lower the vacuum level.

2015-10-16 10:55 GMT-04:00 Andrew Sarangan :

> The 10^-7 Torr during evaporation is a pretty decent vacuum level, and the
> oxidation rate should be very minimal especially if you keep the deposition
> rate high.
>
>
>
> On Mon, Oct 12, 2015 at 8:44 PM, Ali Alsaqqa  wrote:
>
> > Hello all,
> >
> > I would like to know what is the best way to prepare films of elemental
> > Chromium. Exact thickness does not matter, but something like hundreds of
> > nanometers should be fine. The target measurement is simple transport (I,
> > V) in the presence of some magnetic field.
> >
> > My main concern here is oxidization. I was thinking about depositing the
> > films using e-beam evaporator, but it can attain a vacuum of only 10-7
> > Torr, and with this level oxidization will occur. MBE is not an option at
> > the moment.
> >
> > I was also thinking about buying wafers from commercial sectors, but I
> will
> > run into the same problem, i.e. the surface will oxidize as soon as it
> > contacts air.
> >
> > Are there any suggestions?
> >
> > Ali M. Alsaqqa,
> > PhD candidate,
> > Department of Physics,
> > University at Buffalo, NY, USA
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> Hosted by the MEMS and Nanotechnology Exchange, the country's leading
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--
Ali M. Alsaqqa,
PhD candidate,
Department of Physics,
University at Buffalo, NY, USA
_______________________________________________
Hosted by the MEMS and Nanotechnology Exchange, the country's leading
provider of MEMS and Nanotechnology design and fabrication services.
Visit us at http://www.mems-exchange.org

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