At a high deposition rate, the impingement rate of Cr on the substrate will be higher than the impingement rate of background gases. But at 10^-7 Torr I still don't think oxidation should be a problem. Also, as Michael suggested, Cr is a getter, so you should see the pressure drop as the evaporation rate is increased. So run it for a few minutes before opening the shutter. On Fri, Oct 16, 2015 at 4:12 PM, Ali Alsaqqawrote: > Thanks Andrew. Are you suggesting depositing at a higher rate to reduce the > total time of deposition and hence time of exposition to oxygen? I would > have thought that the higher the rate, the higher the chamber temperature > and hence the lower the vacuum level. > > 2015-10-16 10:55 GMT-04:00 Andrew Sarangan : > > > The 10^-7 Torr during evaporation is a pretty decent vacuum level, and > the > > oxidation rate should be very minimal especially if you keep the > deposition > > rate high. > > > > > > > > On Mon, Oct 12, 2015 at 8:44 PM, Ali Alsaqqa > wrote: > > > > > Hello all, > > > > > > I would like to know what is the best way to prepare films of elemental > > > Chromium. Exact thickness does not matter, but something like hundreds > of > > > nanometers should be fine. The target measurement is simple transport > (I, > > > V) in the presence of some magnetic field. > > > > > > My main concern here is oxidization. I was thinking about depositing > the > > > films using e-beam evaporator, but it can attain a vacuum of only 10-7 > > > Torr, and with this level oxidization will occur. MBE is not an option > at > > > the moment. > > > > > > I was also thinking about buying wafers from commercial sectors, but I > > will > > > run into the same problem, i.e. the surface will oxidize as soon as it > > > contacts air. > > > > > > Are there any suggestions? > > > > > > Ali M. Alsaqqa, > > > PhD candidate, > > > Department of Physics, > > > University at Buffalo, NY, USA > > > _______________________________________________ > > > Hosted by the MEMS and Nanotechnology Exchange, the country's leading > > > provider of MEMS and Nanotechnology design and fabrication services. > > > Visit us at http://www.mems-exchange.org > > > > > > Want to advertise to this community? See http://www.memsnet.org > > > > > > To unsubscribe: > > > http://mail.mems-exchange.org/mailman/listinfo/mems-talk > > > > > _______________________________________________ > > Hosted by the MEMS and Nanotechnology Exchange, the country's leading > > provider of MEMS and Nanotechnology design and fabrication services. > > Visit us at http://www.mems-exchange.org > > > > Want to advertise to this community? See http://www.memsnet.org > > > > To unsubscribe: > > http://mail.mems-exchange.org/mailman/listinfo/mems-talk > > > > > > -- > Ali M. Alsaqqa, > PhD candidate, > Department of Physics, > University at Buffalo, NY, USA > _______________________________________________ > Hosted by the MEMS and Nanotechnology Exchange, the country's leading > provider of MEMS and Nanotechnology design and fabrication services. > Visit us at http://www.mems-exchange.org > > Want to advertise to this community? See http://www.memsnet.org > > To unsubscribe: > http://mail.mems-exchange.org/mailman/listinfo/mems-talk > _______________________________________________ Hosted by the MEMS and Nanotechnology Exchange, the country's leading provider of MEMS and Nanotechnology design and fabrication services. Visit us at http://www.mems-exchange.org Want to advertise to this community? See http://www.memsnet.org To unsubscribe: http://mail.mems-exchange.org/mailman/listinfo/mems-talk