Anther thing to keep in mind is that the Cr will act as a getter within the
vacuum chamber.  So if you run the Cr deposition for a while with the shutter
closed you will essentially scavenge residual oxygen.

Regards,
  Michael
________________________________________
From: mems-talk-bounces+michael.martin=louisville.edu@memsnet.org [mems-talk-
bounces+michael.martin=louisville.edu@memsnet.org] on behalf of Andrew Sarangan
[asarangan@gmail.com]
Sent: Friday, October 16, 2015 10:55 AM
To: General MEMS discussion
Subject: Re: [mems-talk] Best way to make elemental Cr films

The 10^-7 Torr during evaporation is a pretty decent vacuum level, and the
oxidation rate should be very minimal especially if you keep the deposition
rate high.



On Mon, Oct 12, 2015 at 8:44 PM, Ali Alsaqqa  wrote:

> Hello all,
>
> I would like to know what is the best way to prepare films of elemental
> Chromium. Exact thickness does not matter, but something like hundreds of
> nanometers should be fine. The target measurement is simple transport (I,
> V) in the presence of some magnetic field.
>
> My main concern here is oxidization. I was thinking about depositing the
> films using e-beam evaporator, but it can attain a vacuum of only 10-7
> Torr, and with this level oxidization will occur. MBE is not an option at
> the moment.
>
> I was also thinking about buying wafers from commercial sectors, but I will
> run into the same problem, i.e. the surface will oxidize as soon as it
> contacts air.
>
> Are there any suggestions?
>
> Ali M. Alsaqqa,
> PhD candidate,
> Department of Physics,
> University at Buffalo, NY, USA
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