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patterning sub-micron holes in chromium (Wendell McCulley)
patterning sub-micron holes in chromium (Daniel Figura)
patterning sub-micron holes in chromium (D.Grimm@ifw-dresden.de)
PDMS surface treatment (DEBASHIS MAJI)
SiO2 RIE etching without carbonizing the photoresist (weiquan yang)
PDMS surface treatment (Shirla Cheng)
AZ 9260 processing (Daniel Figura)
50 nm resist (Daniel Figura)
50 nm resist (Robert Black)