Nahid, lots of work with cantilevers on resist led to multiple chamber
plasma strippers to allow long time in plasma for dry strip.  Lots of
work with wet strippers led to vacuum/hot dehydrators followed by anti
stiction coating in vacuum/hot chemical deposition system for complete
hydrophobic surface.

Bill Moffat, CEO
Yield Engineering Systems, Inc.
203-A Lawrence Drive, Livermore, CA  94551-5152
(925) 373-8353

www.yieldengineering.com


-----Original Message-----
From: mems-talk-bounces+bmoffat=yieldengineering.com@memsnet.org
[mailto:mems-talk-bounces+bmoffat=yieldengineering.com@memsnet.org] On
Behalf Of nahid vahabi
Sent: Monday, September 20, 2010 4:10 PM
To: General MEMS discussion
Subject: Re: [mems-talk] releasing cantilever beams without release
holes

Thanks to your emails. I have some Cr/Au cantilevers anchored to
substrate, the sacrificial layer is a very thin layer of
photo-resist(HPR504) . They are pretty wide and large cantilevers
(200*400 um). I am afraid that any wet etch (even followed by critical
dry point) would result in sticking problems. Dry etch is also usually
directional so I may not get rid of the resist completely.