durusmail: mems-talk: Thin film deposition at room temperature
Thin film deposition at room temperature
2012-08-23
Yingtao Tian
Thin film deposition at room temperature
G. Puebla-Hellmann
2012-08-23
Hi Yingtao,

do you also need ambient pressure? We typically use 7-10 nm of aluminum
on top of PMMA to avoid charging when doing electron beam lithography,
deposited in an electron beam evaporator. It's transparent for the beam,
after writing we remove it in NaOH, then develop. If you put on a layer
with a thickness of more than 30 nm, it will be opaque. You can also use
TMAH based developer to then remove the layer. As your resist was not
exposed yet it should work. I guess this will work with any metal, so
you can choose the chemistry. I guess that at a slow enough rate, your
sample won't heat up. The uv emission from the evaporator may be an
issue, for pmma and ebl it works though.

best,

gabriel

Am 8/23/2012 7:48 PM, schrieb Yingtao Tian:
> Hi Nabhiraj,
>
> I need some non-transparent film on photoresist to block the UV during the
next step exposure.
>
> Thanks,
> Yingtao
>
> -----Original Message-----
> From: mems-talk-bounces+y.tian=bham.ac.uk@memsnet.org [mailto:mems-talk-
bounces+y.tian=bham.ac.uk@memsnet.org] On Behalf Of Nabhiraj Yalagoud
> Sent: 23 August 2012 18:36
> To: General MEMS discussion
> Subject: Re: [mems-talk] Thin film deposition at room temperature
>
> Hello,
> What film on what substrate you want?
> Nabhiraj
>
> On Thu, Aug 23, 2012 at 8:41 PM, Yingtao Tian  wrote:
>
>> Hi All,
>>
>> I am trying to get round of how to put a thin film down at room
>> temperature. I need a localised thin film with following properties:
>>
>> 1. non-transparent
>> 2. as thin as possible - say in the order of few microns 3. easy to
>> remove 4. can be applied at around room temperature
>>
>> I am thinking of some possible spray, but have not got any clue. I
>> would appreciate if you have some  interesting idea about it.
>>
>>
>> Thanks a lot.
>>
>> Regards,
>> Yingtao
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