Kevin, I'm looking to make 1 to 25 micron scale features to begin.


On Thu, Nov 8, 2012 at 8:22 AM, Kevin Nichols
wrote:

> Nathan,
>
> If you can, you might get better advice by explaining what you want to
> build in more detail. FIB for microfluidics sounds like overkill.
> There's almost certainly a better, cheaper way to get what you want.
>
> - Kevin
>
> On Wed, Nov 7, 2012 at 6:54 PM, Nathan McCorkle  wrote:
> > Hi Brian,
> > yesterday I sat down with the FIB guy I just met and he went over most of
> > the instrument and principals, so yes defocusing would help I think. I'm
> > making 1-50 micron wide channels, but I've heard that corners can cause
> > pressure drops in fluidic channels (which I aim to make) which can cause
> > salts and proteins to crystallize and build up potentially even blocking
> > the channel.
> >
> > I don't know what undulation 'frequency' would be best, but I figure I
> > should start by not seeing anything visible at 500X optical
> magnification,
> > so what can you resolve at that mag, I'd say ballpark 0.3 microns.
> >
> >
> > On Mon, Nov 5, 2012 at 3:22 PM, Brian Stahl  wrote:
> >
> >> Dear Nathan,
> >>
> >> I'm not a FIB expert but I have used an FEI Helios Dualbeam a little
> bit; I
> >> think you should be able to defocus the ion beam slightly to blur/smooth
> >> edges during patterning.  I would think that an isotropic chemical etch
> >> after patterning would also smooth out some edge roughness (potentially
> at
> >> the expense of overall resolution).  What feature size are you trying to
> >> pattern that you're worried about LER?
> >>
> >> Best regards,
> >>
> >> Brian
> >>
> >> --
> >> Brian C. Stahl
> >> Graduate Student Researcher
> >> UCSB Materials Research Laboratory
> >> brian.stahl@gmail.com / bstahl@mrl.ucsb.edu
> >> Cell: (805) 748-5839
> >> Office: MRL 3117A
> >>
> >>
> >> On Sun, Nov 4, 2012 at 3:30 AM, Nathan McCorkle 
> wrote:
> >>
> >> > I am working on microfluidics and have the opportunity to use an older
> >> FEI
> >> > FIB. My concern this whole time has been to reduce jagged edges by not
> >> > using a rastered master, originally I was thinking of building my own
> >> 405nm
> >> > laser cutter that wouldn't pulse the beam while it traced my lines.
> >> >
> >> > With the FIB I'm thinking I could master gold-sputtered glass or
> quartz,
> >> > then do contact lithography. Since the FIB does rastering, I'm again
> >> > concerned with nanometer jaggies. Is there some way I can blur the
> >> > lithography step a bit to smooth the edges? Or maybe make features
> >> smaller
> >> > than they should be, then chemically etch the master for a brief time?
> >> >
> >> > --
> >> > -Nathan
> >> > _______________________________________________
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> >
> >
> >
> > --
> > -Nathan
> > _______________________________________________
> > Hosted by the MEMS and Nanotechnology Exchange, the country's leading
> > provider of MEMS and Nanotechnology design and fabrication services.
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> _______________________________________________
> Hosted by the MEMS and Nanotechnology Exchange, the country's leading
> provider of MEMS and Nanotechnology design and fabrication services.
> Visit us at http://www.mems-exchange.org
>
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--
-Nathan
_______________________________________________
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