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mems-talk
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Re: SU8 & KOH (BERAUER,FRANK (HP-Singapore,ex7))
thick photoresist for dry etching (mennabli@grundfos.com)
SU-8 photocatalyst diffusion constants (Jacques Jonsmann)
thick photoresist for dry etching (Mihaela Balseanu)
How to select the adhesion metal for glass wafer ? (3319(李宗璟)Vincent)
Metal mask for anisotropic etching in EDP, KOH (Prem Pal)
PDMS (Shay Kaplan)
Is there such polymer? (Michael D Martin)
Re: SJR-5740 issues (Mark Shaw)
RE: SU 8 PHOTORESIST (Franck CHOLLET) (Mark Shaw)
Re : Dispensing of SU8-100 (Mark Shaw)
Metal mask for anisotropic etching in EDP, KOH (kirt_williams@agilent.com)
Re: hydroxyl functional crosslinker (Jeff Classey)
How to select the adhesion metal for glass wafer ? (Mighty Platypus)
Dry film resist for greyscale lithography? (Fred C Thomas III)