Hi All I face a problem of keeping AZ5214e photoresist on top of Al2O3 film during BHF etch. I have done post bake of PR at 150C for 30 min however it still does not help. Does any of you know the solution or any idea how to keep PR On top of alumina during BHF etch? Thank you in advance Best regards Maksym Plakhotnyuk PHD student at DTU _______________________________________________ Hosted by the MEMS and Nanotechnology Exchange, the country's leading provider of MEMS and Nanotechnology design and fabrication services. Visit us at http://www.mems-exchange.org Want to advertise to this community? See http://www.memsnet.org To unsubscribe: http://mail.mems-exchange.org/mailman/listinfo/mems-talk