durusmail: mems-talk: AZ5214E photoresist adhesion problem on Al2O3 coated Si wafers
AZ5214E photoresist adhesion problem on Al2O3 coated Si wafers
AZ5214E photoresist adhesion problem on Al2O3 coated Si wafers
2016-06-15
AZ5214E photoresist adhesion problem on Al2O3 coated Si wafers
2016-06-15
AZ5214E photoresist adhesion problem on Al2O3 coated Si wafers
2016-06-15
AZ5214E photoresist adhesion problem on Al2O3 coated Si wafers
2016-06-15
KarthiKeyan K (2 parts)
AZ5214E photoresist adhesion problem on Al2O3 coated Si wafers
2016-06-15
Sales (3 parts)
AZ5214E photoresist adhesion problem on Al2O3 coated Si wafers
2016-06-15
2016-06-15
AZ5214E photoresist adhesion problem on Al2O3 coated Si wafers
Sales
2016-06-15
SurPass adhesion promoters from Transene can improve resist adhesion on ceramic.
Alternatively, PKP photoresist would be more resistant.
http://transene.com/pkp/

Chris Christuk
Transene

-----Original Message-----
From: mems-talk-bounces+sales=transene.com@memsnet.org [mailto:mems-talk-
bounces+sales=transene.com@memsnet.org] On Behalf Of Maksym Plakhotnyuk
Sent: Wednesday, June 08, 2016 1:44 PM
To: mems-talk@memsnet.org
Subject: [mems-talk] AZ5214E photoresist adhesion problem on Al2O3 coated Si
wafers

Hi All

I face a problem of keeping AZ5214e photoresist on top of Al2O3 film during BHF
etch.
I have done post bake of PR at 150C for 30 min however it still does not help.
Does any of you know the solution or any idea how to keep PR On top of alumina
during BHF etch?

Thank you in advance

Best regards
Maksym Plakhotnyuk
PHD student at DTU


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